AM processing parameters tailoring
Processing Parameters’ Effect on Full-field Temperature
Using patent-pending solver to simulate the full-field temperature track-by-track and layer-by-layer and predict the effects of the key processing parameters, e.g. the heat source energy input and its diameter, scanning speed and relevant acceleration and deceleration, deposit strategy/pattern etc., on the temperature field changes, including the temperature gradient and cooling rate. The fundamental of the L.A.M.P.S. software can see the LAMPS users’ manual (click to download the manual). LAMPS is copyright protected software (No. Tx 8-153-990, No.TXu 2-074-473)
For more information , please contact us.
L.A.M.P.S. simulation example(1)
Full-scale temperature change of a single track deposition with 30S cooling time after deposition finished (from left to right : temperature field, temperature gradient and cooling rate)
L.A.M.P.S. simulation example (2)
Full-scale temperature field change for a double-track deposition with 30s cooling time after deposition finished (from left to right : temperature field, temperature gradient and cooling rate)
Experimental Comparison
The comparison between experimental testing and L.A.M.P.S. simulation result for above single-track deposition and double-track deposition

What is Your Next Action……
Want to Buy Simulation Service
Want to Know More about L.A.M.P.S.
Full-scale AM thermomechanical analyses
Full-scale AM Thermomechanical Response
Based on the full-scale temperature field change and metal solidification shrinkage characteristics, the Layerwise Additive Manufacturing Predictions and Simulations (L.A.M.P.S.) software can simulate the full-scale thermomechanical response by using our pending-patent technique and layerwise 3D mechanical model during the Additive manufacturing procedure. The three-dimensional shrinkage deformation caused by solidification are fully considered by our thermo-mechanical model and solver. For more information about the fundamental, please see the LAMPS software user’s manual(click to download the manual).
Distortion and residual stresses at deposit-end and as-deposited after single-track deposition

Distortion and residual stress at deposit-end and as-deposited after double-track deposition
